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Innovative EUV lithography technology dramatically increases energy efficiency and reduces capital cost of semiconductor manufacturing
Release time:
2024-08-02
Professor Tsumoru Shintake of Okinawa Institute of Science and Technology (OIST) has proposed an extreme ultraviolet (EUV) lithography technology that surpasses the standard in semiconductor manufacturing.
Professor Tsumoru Shintake of Okinawa Institute of Science and Technology (OIST) has proposed an extreme ultraviolet (EUV) lithography technology that surpasses the standard in semiconductor manufacturing.
EUV lithography based on this design can work with smaller EUV light sources, reducing costs and dramatically improving reliability and lifetime of the machines. It also consumes less than one-tenth the power of conventional EUV lithography machines, helping the semiconductor industry become more environmentally sustainable.
This technology has been made possible by solving two issues that were previously considered insurmountable in this field. The first involves a novel optical projection system consisting of only two mirrors. The second involves a new method to efficiently direct EUV light onto logic patterns on a flat mirror (the photomask) without blocking the optical path.
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