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1.New approach to large-area MLA processing

     UV three-dimensional lithography technology

With the new round of industrial upgrading, there is an urgent need for large-area microlens arrays (MLA) in the fields of light field 3D display, sensing and detection, patterned lighting, integrated imaging and optical security. It is necessary to solve the industry problems of digital design and high-quality processing of large-area (meter-scale) microlens arrays or micro-Fresnel lens arrays. Conventional microlens array processing technology is no longer able to meet this new development demand. In recent years, a MLA preparation method - ultraviolet three-dimensional lithography technology - has been gradually developed. With its unique digital algorithm and high-precision exposure mode, the three-dimensional lithography method supports the design and preparation of various types (diameter, surface shape, focal length, fill factor, area) of MLA molds, and the microlens shape accuracy is maintained within the submicron or even nanometer accuracy range. , The picture below is a process flow chart for preparing MLA by UV three-dimensional lithography.

Three-dimensional photolithography preparation MLA process flow

2.MLA high-fidelity replication

Batch replication - UV nanoimprint technology preferably uses a nickel plate mold and a UV nanoimprint lithography system to replicate MLA with high fidelity on the surface of the substrate (film/glass). The roll-to-flat nanoimprinting system is suitable for precise replication on the surface of substrates such as glass/silicon wafers/plastic sheets; the roll-to-roll nanoimprinting system is suitable for batch precision replication on the surface of films, with a speed of 10 to 50 m/min@m MLA films of various specifications and models can be mass-produced. The service life of nickel plate imprinting molds reaches tens of thousands to millions of square meters, which effectively reduces the manufacturing cost of large-area MLA films. UV nanoimprinting batch quality is excellent.

 Nanoimprinting systems for different purposes

3.Applications of MLA

MLAs with excellent shape accuracy and alignment are critical in applications that require high reliability and efficiency. Applications range from fiber-coupled beam conversion to laser homogenization to efficient combination of laser stacks of the same wavelength. to light field 3D display, light field imaging, projection lighting, high-sensitivity detection, optical security and wide-viewing threshold imaging.