[Micro-nano manufacturing-popular science knowledge] Nanoimprint lithography NIL technology and applications
Release time:
2024-09-24
1. Challenges and opportunities
With the rapid development of semiconductor technology, the field of micro-nanofabrication puts forward higher requirements on the precision and efficiency of pattern replication. Nanoimprint Lithography (NIL) technology, as an emerging micro-nanofabrication technology, is gradually becoming one of the key technologies to solve the bottleneck of current semiconductor processes. However, NIL technology also faces many challenges, such as the light source wavelength approaching the physical limit, the complexity and high cost of the optical system, and the reduction of production yield. However, at the same time, NIL technology has brought unprecedented development opportunities for semiconductor, photonics, biotechnology and other fields with its advantages of ultra-high resolution, high yield, high fidelity and low cost.
2.Nanoimprint lithography NIL working mode and characteristics
NIL technology abandons the optical projection method in traditional lithography, and adopts the mechanical imprinting method to transfer the pre-designed pattern directly to the target material. The working mode mainly includes four steps: making the master stencil, resin coating, imprinting and curing, and removing the stencil to form the structure. This direct contact printing method greatly improves the precision and efficiency of pattern reproduction and avoids diffraction phenomenon in optical exposure and scattering phenomenon in electron beam exposure. In addition, NIL technology is characterized by high throughput, high fidelity and low cost, enabling fast and consistent replication of nanoscale structures on hundreds or thousands of wafers.
3.Youzhong NIL Technology Research and Application
Youzhong Micro-nano Semiconductor Technology Co., Ltd. is a technological innovative enterprise relying on its own core nanoimprint technology to provide customers with professional semiconductor micro-nano device one-stop solutions. The company has been deeply cultivating in the field of nanoimprinting technology for many years, gathering top talents at home and abroad, and establishing in-depth cooperation with a number of renowned universities and colleges. The core products of Youzhong Micro-nano include micro-structured grating sheets, bio-detection chips, micro-lens arrays, super-lenses and other micro-nano-structured devices, which are widely used in the fields of military, bio-detection, optical communication, consumer electronics and so on. Through continuous optimization of NIL technology, Youzhong Micro-Nano has achieved remarkable results in improving product precision, reducing cost and enhancing production efficiency.
In 2014 the company team began to enter the development of nanoimprinting equipment, materials, templates, and processes.
2017 Diffractive Optical Elements (DOE) made by nanoimprinting technology are applied to 3D sensing.
2020 Nanoimprinting technology is considered a processing means that is expected to replace the existing photolithography technology due to its advantages of ultra-high resolution, easy mass production, low cost, and high consistency. During the same period, the company's nanoimprint technology in a military product to achieve mass production.
In 2023, Canon launched the nanoimprint semiconductor manufacturing equipment “FPA-1200NZ2C”, which marked the transition of nanoimprint technology to practical use. During the same period, the Company's newly developed nanoimprinted gene sequencing chip was recognized by customers and industrialized.
Youzhong independently developed nanoimprint lithography equipment and used it for product development and production. Various types of imprinting modes were developed. Including PDMS flexible film imprinting equipment; RTP imprinting equipment; PET flexible film imprinting equipment and so on.
4. Looking into the future
With the continuous development of nanotechnology, the application of NIL technology in the field of micro-nano manufacturing has a broader prospect. In the future, Youzhong Micro-Nano will continue to uphold the concept of innovation, increase investment in research and development, and promote the continuous optimization and upgrading of NIL technology. The company plans to promote the application and expansion of NIL technology in more fields by strengthening cooperation with universities and research institutes to overcome technical problems. At the same time, Youzhong Micro-Nano will also focus on market expansion and brand building to enhance the market competitiveness and influence of its products. Looking ahead, Nanoimprint lithography will play a more important role in semiconductor, photonics, biotechnology and other fields, injecting new vitality for the progress of science and technology and industrial development.
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